The ballistic FET: design, capacitance and speed limit

The ballistic FET: design, capacitance and speed limit
复制标题

DOI:
10.1109/iedm.2001.979425
复制
发表时间:
2001-12
期刊:
International Electron Devices Meeting. Technical Digest (Cat. No.01CH37224)
影响因子:
--
通讯作者:
Paul M. Solomon;Steven E. Laux
Paul M. Solomon;Steven E. Laux
中科院分区:
其他
文献类型:
--
作者:
Paul M. Solomon;Steven E. Laux

文献摘要

被引文献

相似文献

In this paper we present a design methodology for the ballistic FET (BFET) which illuminates many topics currently under discussion such as the injection velocity, the role of the contacts, and the meaning of the capacitance and mobility. Both InGaAs/InAlAs in the 20-30 nm gate length range, and Si/SiO/sub 2/ FETs in the 10-20 nm range are simulated using Monte Carlo techniques, where the InGaAs FETs are almost purely ballistic, whereas the Si FETs were not. Expressions for the BFET drain current are derived in the extreme quantum limit and for zero thickness gate insulator, where the importance of the degeneracy capacitance is emphasized. An ultimate speed limit for the BFET is derived.