A design study on electron beam confinement in a staggered array undulator based on a 3D code
A design study on electron beam confinement in a staggered array undulator based on a 3D code
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基于3D代码的交错阵列波荡器电子束约束设计研究
DOI：
10.1016/s0168-9002(01)01582-0
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发表时间：
2001
影响因子：
1.4
通讯作者：
K. Yoshikawa
中科院分区：
文献类型：
--
作者：
J. Kitagaki;K. Masuda;Z.;T. Kii;T. Yamazaki;K. Yoshikawa
采用交错阵列波荡器来改善电子束限制。交错阵列波荡器具有固有的垂直聚焦力，但没有水平聚焦力，导致光束损失。为了通过额外的水平聚焦力来改善电子束限制，使用新开发的 3D 代码对铁磁体件的几何形状进行了细化。结果发现，可以通过波荡器的电子数量增加了 10%，因此自发发射强度也增加了 10%。对于长度为 0.5m、间隙宽度为 5mm 的波荡器，4MeV 电子束的透射率为 99.7%。此外，对于2.0m长的较长波荡器，透射率仍然高达97.3%。
A staggered array undulator is implemented to improve the electron beam confinement. A staggered array undulator has an inherent vertical focusing force, but it has no horizontal focusing force, resulting in a beam loss. To improve the electron beam confinement with an additional horizontal focusing force, the geometrical shape of the ferromagnet pieces were refined by use of a newly developed 3D code. As a result, the number of electrons, which can pass through the undulator, was found to increase by 10%, and consequently, the spontaneous emission intensity also increased by 10%. Transmittance of a 4MeV electron beam is found to be 99.7% for an undulator of 0.5m length and 5mm gap width. Also, for a longer undulator of 2.0m length, the transmittance is found still high up to 97.3%.