Silicon grisms and immersion gratings produced by anisotropic etching: testing and analysis
Silicon grisms and immersion gratings produced by anisotropic etching: testing and analysis
复制标题
各向异性蚀刻生产的硅光栅和浸没光栅：测试和分析
DOI：
10.1117/12.461759
复制
发表时间：
2003
期刊：
影响因子：
--
通讯作者：
D. Jaffe
中科院分区：
文献类型：
--
作者：
J. P. Marsh;O. Ershov;D. Jaffe
由于它们可以在给定的衍射限制分辨率下大大减少所需的准直光束尺寸，因此硅浸没光栅和光栅是一种从空间进行高分辨率红外光谱的使能技术，并且在一系列地面和机载仪器中非常有用。我们已经使用各向异性蚀刻技术在笨重的硅衬底上生产衍射光栅。这些器件可以作为高分辨率光栅（当用于传输时），作为粗糙的前表面光栅，或作为非常高分辨率的浸入光栅。我们已经能够生产出具有高光效率的设备，通过确保它们的入口面和凹槽表面是光学平坦的，并且凹槽位置在适合使用光栅的波长的公差范围内是正确的。我们在这里报告了高分辨率Si光栅在透射（格栅）和反射（浸入）模式下的测试和评估。
Because they can vastly reduce the required collimated beamsize at a given diffraction-limited resolution, silicon immersion gratings and grisms are an enabling technology for high resolution infrared spectroscopy from space and are highly useful in a range of ground-based and airborne instruments. We have used anistropic etching techniques to produce diffraction gratings on bulky silicon substrates. These devices can serve as high resolution grisms (when used in transmission), as coarse front-surface gratings, or as very high resolution immersion gratings. We have been able to produce devices with high optical efficiency by insuring that their entrance faces and groove surfaces are optically flat and that the groove positions are correct to within tolerance appropriate to the wavelength where the gratings will be used. We report here on testing and evaluation of high resolution Si gratings both in transmission (grism) and in reflection (immersion) mode.