Versatile Direct Laser Writing Lithography Technique for Surface Enhanced Infrared Spectroscopy Sensors
Versatile Direct Laser Writing Lithography Technique for Surface Enhanced Infrared Spectroscopy Sensors
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DOI：
10.1021/acssensors.6b00469
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发表时间：
2016-09-01
期刊：
影响因子：
8.9
通讯作者：
Maier, Stefan Alexander
中科院分区：
文献类型：
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作者：
Braun, Avi;Maier, Stefan Alexander
纳米结构化学传感器的设计、测试和制造的挑战是在合理的时间内制造mm（2）尺寸的纳米结构阵列。在此，我们介绍并展示了如何直接激光写入（DLW）在正性光刻胶，然后剥离过程中，可用于快速制造（高达三倍快于可比的电子束光刻系统）的纳米级等离子体结构的阵列与控制的设计和尺寸的纳米结构的很大程度。我们展示了纳米结构阵列的功能，通过各种DLW方法制造，与表面增强红外吸收（SEIRA）检测的九个振动模式的PMMA。我们还讨论了等离子体共振的可调谐性，因此光谱检测范围，通过改变纳米结构的尺寸和阵列参数，并通过显示由各种基板和天线材料制成的设备来展示这种制造方法的灵活性。
A challenge for design, testing, and fabrication of nanostructured chemical sensors is the fabrication of mm(2) size arrays of nanostructures in a reasonable time. Herein, we introduce and show how direct laser writing (DLW) in positive-tone photoresists, followed by lift-off process, can be used for fast fabrication (up to three times faster than a comparable electron beam lithography system) of arrays of nanoscale plasmonic structures with a great level of control over the design and dimensions of the nanostructures. We demonstrate the function of nanostructured arrays, fabricated by various DLW approaches, with surface enhanced infrared absorption (SEIRA) detection of nine vibrational modes of PMMA. We also discuss the tunability of the plasmonic resonance-and hence the spectral detection range-by alteration of the size and array parameters of the nanostructures, and demonstrate the flexibility of this fabrication method by showing devices made of various substrate and antenna materials.