A Rapid Photopatterning Method for Selective Plating of 2D and 3D Microcircuitry on Polyetherimide
A Rapid Photopatterning Method for Selective Plating of 2D and 3D Microcircuitry on Polyetherimide
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DOI：
10.1002/adfm.201704451
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发表时间：
2018-02-07
影响因子：
19
通讯作者：
Desmulliez, Marc P. Y.
中科院分区：
文献类型：
--
作者：
Marques-Hueso, Jose;Jones, Thomas D. A.;Desmulliez, Marc P. Y.
在这项工作中，一种方法用于快速合成金属微轨道上聚醚酰亚胺。该方法依赖于聚合物基底表面上的银纳米颗粒从光敏氯化银（AgCl）的光合作用，所述光敏氯化银（AgCl）直接在聚醚酰亚胺表面上合成。该研究表明，使用氯化银作为光敏中间体加速反应，导致形成银纳米粒子的速度比其他光解方案快两个数量级。图案化可以在蓝光下进行，与UV曝光相比具有显著的优点。对微电子和3D打印行业有重大意义的聚合物可以使用这种启发性的技术通过光直接图案化，其吞吐量足够高，具有商业优势。短至几秒的光暴露足以允许被照射的聚醚酰亚胺表面的直接金属化。结果表明，种子层所需的银是最小的，并且随后的无电镀铜导致在柔性膜和3D打印表面上的光图案化区域上的电路的导电迹线的选择性生长。
In this work, a method for the rapid synthesis of metallic microtracks on polyetherimide is presented. The method relies on the photosynthesis of silver nanoparticles on the surface of the polymer substrates from photosensitive silver chloride (AgCl), which is synthesized directly on the polyetherimide surface. The study reveals that the use of AgCl as a photosensitive intermediate accelerates the reactions leading to the formation of silver nanoparticles by up to two orders of magnitude faster than other photodecomposition schemes. The patterning can be conducted under blue light, with notable advantages over UV exposure. Polymers of significant interest to the microelectronics and 3D printing industries can be directly patterned by light using this photography-inspired technique at throughputs high enough to be commercially advantageous. Light exposures as short as a few seconds are sufficient to allow the direct metallization of the illuminated polyetherimide surface. The results show that the silver required for the seed layer is minimal, and the later copper electroless plating results in the selective growth of conductive tracks for circuitry on the light-patterned areas, both on flexible films and 3D printed surfaces.