Study of Swelling Action during Developing for ArF Resist by using QCM Method
Study of Swelling Action during Developing for ArF Resist by using QCM Method
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QCM法研究ArF抗蚀剂显影过程中的溶胀作用
DOI：
10.2494/photopolymer.23.421
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发表时间：
2010
影响因子：
0.8
通讯作者：
A. Sekiguchi
中科院分区：
文献类型：
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作者：
A. Sekiguchi
石英晶体微天平（QCM）最近已成为许多领域研究薄膜的有用工具。自从最初将 QCM 作为真空沉积监测器用于研究用途以来，QCM 一直在不断改进，现在用于监测真空下的各种条件。用于监测空气和液体的各种工具的应用迅速扩展。作者致力于基于薄膜产生的光干涉的开发监视器的研究。对于显影过程中溶解不均匀的树脂或显影过程中膨胀的材料，采用基于薄膜干涉的传统评估方法不会产生清晰的干涉图案，并且很难获得准确的溶解率。为此，我们开发了一种基于 QCM 的开发分析仪 (RDA-QZ3)，能够直接监测薄膜质量随频率变化的变化。本文讨论了用新型分析仪测量的丙烯酸化学放大 ArF 正性抗蚀剂的显影行为。
The quartz crystal microbalance (QCM) has recently emerged as useful tools for studying thin films in many fields. QCMs have been continuously improved since their initial research use application as a vacuum deposition monitor and are now used to monitor diverse conditions under vacuum. Applications have rapidly expanded in various tools used to monitor air and liquids. The authors have pursued research on development monitors based on light interference generated by thin films. Resins that dissolve unevenly during development or materials that swell during development do not produce clear interference patterns with conventional evaluation methods based on thin film interference, and obtaining accurate dissolution rates has proven difficult. In response, we developed a QCM-based development analyzer (RDA-QZ3) capable of directly monitoring changes in film mass as changes in frequency. This paper discusses the development behavior of an acrylic chemically-amplified ArF positive resist measured with the new analyzer.