FO[<]-uniformity

FO[<]-uniformity
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FO[<]-均匀度

DOI:
10.1109/ccc.2006.20
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发表时间:
2006
期刊:
21st Annual IEEE Conference on Computational Complexity (CCC'06)
影响因子:
--
通讯作者:
K. Lange
K. Lange
中科院分区:
--
文献类型:
--
作者:
C. Behle;K. Lange

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引入了比通常的FO[<,+,*]-均匀性= FO[<,Bit]-均匀性更具限制性的均匀性概念。结果表明,如果考虑相应电路中门的扇入效应,Barrington等人提出的一般框架仍然成立
Uniformity notions more restrictive than the usual FO[<, +, *]-uniformity = FO[<, Bit]-uniformity are introduced. It is shown that the general framework exhibited by Barrington et al. still holds if the fan-in of the gates in the corresponding circuits is considered