KERR EFFECT ENHANCEMENT IN FERROMAGNETIC FILMS
KERR EFFECT ENHANCEMENT IN FERROMAGNETIC FILMS
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DOI：
10.1109/tmag.1966.1065997
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发表时间：
1966-01-01
影响因子：
2.1
通讯作者：
FAN, GJ
中科院分区：
文献类型：
--
作者：
AHN, KY;FAN, GJ
本文研究了在铁磁薄膜外涂介质膜对磁光克尔效应的增强作用。它被视为光波的阻抗匹配问题。得到了极克尔效应的封闭解。同样的分析，经过修改，可以应用于纵向克尔效应。在电介质膜沉积过程中，用激光束（λ = 6328nm）连续监测电介质厚度对增强的影响。铁膜上的SiO膜对纵向Kerr信号的放大倍数为5，且随介质厚度的变化呈周期性变化。实验测得的周期为1600 Ω，与计算值符合得很好。的意义ofloops，这也是周期性变化的电介质厚度的函数，是可以解释的相位因子出现在反射系数之间的差异。
The enhancement of the Kerr magneto-optic effect by overcoating a ferromagnetic film with a dielectric film is studied. It is treated as an impedance-matching problem for the light wave. Closed form solutions are obtained for the polar Kerr effect. The same analysis, with modifications, can be applied to the longitudinal Kerr effect. The effect of the dielectric thickness on the enhancement is continuously monitored with a laser beam (λ = 6328Å) during the dielectric film deposition. The amplification of the longitudinal Kerr signal with SiO films on iron film is of the order of five, and the enhancement varies periodically as a function of dielectric thickness. The experimentally observed period, 1600Å, agrees well with the calculated value. The sense ofloops, which also varies periodically as a function of the dielectric thickness, is explainable in terms of the phase factor which appears in the difference between the reflection coefficients.