Fabrication of nanochannels using underexposed nanoimprint method
Fabrication of nanochannels using underexposed nanoimprint method
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DOI：
10.1049/mnl.2014.0412
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发表时间：
2015-03
影响因子：
1.3
通讯作者：
Zhiwen Wang;J. Chu;Qianyi Wang;Ran Zhang;Yan Cui
中科院分区：
文献类型：
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作者：
Zhiwen Wang;J. Chu;Qianyi Wang;Ran Zhang;Yan Cui
使用曝光不足的纳米压印方法制备纳米通道的均匀阵列。纳米沟槽被均匀地弯曲，并且塌陷的程度由暴露时间控制。在沉积密封材料之后，成功地制造了尺寸为100 nm的纳米通道。通过调整光栅参数，解决了光栅的遮挡问题。所提出的制造技术可以是非常有帮助的微/纳米分析系统。
Uniform arrays of nanochannels were made using an underexposed nanoimprint method. The nanotrenches were bended uniformly, and the degree of the collapse was controlled by the exposure time. After deposition of the sealing material, nanochannels with a dimension of 100 nm were successfully fabricated. The blocking problem was solved by adjusting the parameters of the gratings. The proposed fabrication technique can be very helpful in micro-/nanoanalysis systems.