Growth of Highly Transparent Amorphous Carbon Films Using Beam Plasma Source
Growth of Highly Transparent Amorphous Carbon Films Using Beam Plasma Source
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DOI：
10.3390/coatings12081159
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发表时间：
2022-08
期刊：
影响因子：
3.4
通讯作者：
Youngsu Kim;Nina Baule;M. Shrestha;Q. Fan
中科院分区：
文献类型：
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作者：
Youngsu Kim;Nina Baule;M. Shrestha;Q. Fan
采用单束等离子体源在室温下存款氢化非晶碳（a-C：H）涂层。以甲烷为源气体，在不同射频功率下沉积a-C：H涂层，制备出透明、耐久的涂层。薄膜沉积速率与离子源功率几乎成线性关系。厚度约为100 nm的氢化非晶碳膜在紫外到红外范围内表现出高度透明性，透射率约为90%，光学带隙约为3.7 eV。涂层还具有理想的机械性能，杨氏模量为~78 GPa，密度为~1.9 g/cm 3。高透射率和高耐久性的组合材料性质使得离子源沉积的a-C：H涂层对于许多应用具有吸引力。
A single beam plasma source was used to deposit hydrogenated amorphous carbon (a-C:H) coatings at room temperature. Using methane source gas, a-C:H coatings were deposited at different radio frequency (RF) power to fabricate transparent and durable coatings. The film deposition rate was almost linearly proportional to the ion source power. Hydrogenated amorphous carbon films of ~100 nm thickness appeared to be highly transparent from UV to the infrared range with a transmittance of ~90% and optical bandgap of ~3.7 eV. The coatings also possess desirable mechanical properties with Young’s modulus of ~78 GPa and density of ~1.9 g/cm3. The combined material properties of high transmittance and high durability make the ion-source-deposited a-C:H coatings attractive for many applications.