Sub-100 nm Patterning of supported bilayers by nanoshaving lithography
Sub-100 nm Patterning of supported bilayers by nanoshaving lithography
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DOI：
10.1021/ja077730s
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发表时间：
2008-03-05
影响因子：
15
通讯作者：
Cremer, Paul S.
中科院分区：
文献类型：
--
作者：
Shi, Jinjun;Chen, Jixin;Cremer, Paul S.
采用原子力显微镜纳米光刻技术在平面硼硅酸盐衬底上制备了亚100nm宽的支撑磷脂双层膜。首先，将牛血清白蛋白单层涂在玻璃上，然后用AFM尖端选择性地去除长条。空条的宽度可以控制在15厘米以内。通过囊泡融合可在空条带内形成双层线。结果表明，该方法制备的稳定双分子层的尺寸下限为-55 nm。这种尺寸限制源于有利的双层粘附能量和不利的双层边缘能量之间的平衡。
Sub-100 nm wide supported phospholipid bilayers (SLBs) were patterned on a planar borosilicate substrate by AFM-based nanoshaving lithography. First, a bovine serum albumin monolayer was coated on the glass and then selectively removed in long strips by an AFM tip. The width of vacant strips could be controlled down to 15 not. Bilayer lines could be formed within the vacant strips by vesicle fusion. It was found that stable bilayers formed by this method had a lower size limit of -55 nm in width. This size limit stems from a balance between a favorable bilayer adhesion energy and an unfavorable bilayer edge energy.