Electric field in thin dielectric slabs irradiated by electrons
Electric field in thin dielectric slabs irradiated by electrons
复制标题
电子辐照薄介电板中的电场
DOI：
10.1109/23.682459
复制
发表时间：
1998
影响因子：
1.8
通讯作者：
Y. Rogov
中科院分区：
文献类型：
--
作者：
F. A. Bibi;V. Lazurik;Y. Rogov
本文研究了平面平行电子束辐照薄介质平板时的电场分布。入射电子的能量被认为是从1到10兆电子伏。所使用的板具有0.0005至0.05 g/cm/sup 2/的厚度，并且由原子序数在4至79之间的材料制成。本文用一种新的蒙特卡罗方法（轨迹平移法）获得了二次电子的电荷沉积密度数据。基于这些数据的半经验模型，描述了所考虑的平板中的电场分布已经开发。已经注意到，通过使用该模型获得的数据足够好地描述了所考虑的平板中的电场分布。讨论了入射电子能量、厚度和原子序数等参数对电场的影响。
In the present work the study of the electric field distribution in thin dielectric slabs irradiated by plane-parallel electron beams has been made. The energy of incident electrons was considered from 1 to 10 MeV. The used slabs have thickness from 0.0005 to 0.05 g/cm/sup 2/ and are made of materials with atomic numbers between 4 and 79. The data of charge-deposition density of secondary electrons have been obtained by the means of a new Monte Carlo method (called the trajectory translation method). Basing on these data a semi-empirical model that describes the electric field distribution in the considered slabs has been developed. It has been noted that the data obtained by using this model describe well enough the electric field distributions in the considered slabs. The dependency of the electric field on different parameters such as energy of incident electrons, thickness and atomic number is also discussed.