The spatial distribution of negative oxygen ion densities in a dc reactive magnetron discharge
The spatial distribution of negative oxygen ion densities in a dc reactive magnetron discharge
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DOI：
10.1088/0022-3727/46/4/045203
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发表时间：
2013-01
期刊：
影响因子：
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通讯作者：
Steven Scribbins;M. Bowes;J. Bradley
中科院分区：
文献类型：
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作者：
Steven Scribbins;M. Bowes;J. Bradley
使用朗缪尔探针辅助的日食激光光剥离，在0.79至2.40 Pa的压力范围内，在磁控溅射工具的体等离子体中的O−密度的空间分布已被确定。放电操作在直流（200 W）与钛靶和固定的氧-氩压力比为0.2，中毒模式。测量结果显示，在等离子体电位最高的区域，O−密度占据了磁阱下游的一个环形区域。随着压强的增加，高O−密度的区域扩大，峰值密度增加，在2.40 Pa时达到1.5 × 1016 m−3，对应的O−与电子密度比（电负性α）为1.5 × 1016 m−3。在致密负离子区域之外，以及我们的探针可以到达的磁阱区域，我们测量到α < 0.2。结果表明，这些反应磁控等离子体，用于氧化膜的生产，是高度电负性的区域接近基板。
Using Langmuir probe-assisted eclipse laser photodetachment, the spatial distribution of O− densities in the bulk plasma of magnetron sputter tool has been determined for a range of pressures, 0.79 to 2.40 Pa. The discharge was operated in dc (200 W) with a Ti target and a fixed oxygen–argon pressure ratio of 0.2, in poisoned mode. Measurements show significant O− densities occupying an annulus downstream from the magnetic trap in regions of most positive plasma potential. With increasing pressure the region of high O− density expands and the peak densities increase reaching ∼1.5 × 1016 m−3 at 2.40 Pa, corresponding to an O− to electron density ratio (electronegativity α) of ∼2. Outside the area of dense negative ions, and in regions of the magnetic trap accessible to our probe we measure α < 0.2. The results show that these reactive magnetron plasmas, utilized for oxide film production, to be highly electronegative in regions close to the substrate.