New concept of positive photosensitive polyimide: Reaction development patterning (RDP)
New concept of positive photosensitive polyimide: Reaction development patterning (RDP)
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正性光敏聚酰亚胺新概念：反应显影图案化（RDP）
DOI：
10.1002/pola.1327
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发表时间：
2001
期刊：
影响因子：
--
通讯作者：
H. Itatani
中科院分区：
文献类型：
--
作者：
T. Fukushima;T. Oyama;T. Iijima;M. Tomoi;H. Itatani
以n -甲基吡咯烷酮(NMP)/甲苯混合物为溶剂，在γ-戊内酯/吡啶催化剂存在下，将两种二酐和二胺进行直接一锅缩聚，制备了一种不含OH和COOH等特定官能团的可溶多嵌段共聚物。含二氮唑萘醌（DNQ）化合物的聚酰亚胺薄膜在紫外照射下表现出正调行为，然后在乙醇胺/ NMP/ h2o（重量比为1/1/1）的混合物中显影。所得图像的扫描电镜照片显示出膜厚约20 μm的精细图案。其图案的形成是基于重氮萘醌的光重排，在这个过程中，聚酰亚胺的亚胺单元与用作显影剂的胺发生开环反应，并引起随后的聚合物降解。这种新的成像技术结合了光刻和聚酰亚胺蚀刻的原理，我们称之为反应显影模式，其中与模式形成直接相关的主要化学反应发生在显影过程中。
A soluble multiblock copolyimide without specific functional groups such as OH and COOH was prepared by a direct one-pot polycondensation of two types of dianhydrides and diamines in the presence of γ-valerolactone/pyridine catalyst using N-methylpyrrolidone (NMP)/toluene mixture as a solvent. The polyimide film containing the photosensitive agent diazonaphthoquinone (DNQ) compound gave positive-tone behavior by UV irradiation, followed by development in a mixture of ethanolamine/ NMP/H 2 O (1/1/1 by weight). The scanning electron microscopic photograph of the resultant image showed fine patterns with about 20 μm film thickness. Its pattern forming was based on the photorearrangement of diazonaphthoquinone, a process in which the ring-opening reaction of imide units of the polyimide with the amine used as a developer and the following degradation of the polymer are induced. Such a new imaging technique combines principles of photolithography and etching of a polyimide to give, what we call, reaction development patterning in which the main chemical reactions directly related to the pattern formation occur during development.