Effects of surface cleaning on oxidation of NiAl(110)
Effects of surface cleaning on oxidation of NiAl(110)
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DOI：
10.1016/j.apsusc.2004.09.034
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发表时间：
2005-02-28
影响因子：
6.7
通讯作者：
Yoshitake, M
中科院分区：
文献类型：
--
作者：
Song, WJ;Yoshitake, M
利用XPS和LEED研究了Ar+离子溅射对NiAl(110)表面的影响及其氧化行为。 NiAl(l 10)表面经过多次清洗和氧化后，表面粗糙度增大，表面铝浓度降低。该表面在 1020 K 氧化条件下的反应活性较低，但在 500 K 条件下比首次清洁的 NiAl(110) 表面活性更高。将具有氧化物覆盖层的样品加热至约1320 K约15分钟后，氧化物覆盖层完全消失，获得干净的NiAl(110)表面。该结果为清洁NiAl(110)表面提供了一种新的方法。 (C) 2004 Elsevier B.V. 保留所有权利。
The effects of Ar+ ion sputtering on the surface of NiAl(110) and its oxidation behaviors were investigated using XPS and LEED. The surface roughness increased and the surface aluminium concentration decreased after several times of cleaning and oxidation of the NiAl(l 10) surface. This surface was shown to be less reactive under 1020 K oxidation but more reactive under 500 K than the first-cleaned NiAl(110) surface. After heating the samples with oxide over-layer to about 1320 K for about 15 min, the oxide over-layer was completely disappeared and a clean NiAl(110) surface was obtained. This result provided a new way to clean the NiAl(110) surface. (C) 2004 Elsevier B.V. All rights reserved.