Shift of isoelectric point in extended nanospace investigated by streaming current measurement
Shift of isoelectric point in extended nanospace investigated by streaming current measurement
复制标题
DOI：
10.1063/1.3644481
复制
发表时间：
2011-09-19
影响因子：
4
通讯作者：
Kitamori, Takehiko
中科院分区：
文献类型：
--
作者：
Morikawa, Kyojiro;Mawatari, Kazuma;Kitamori, Takehiko
采用流电流法测量了在熔融二氧化硅衬底上制备的扩展纳米通道（580 ~ 2720 nm）中的等电点。在2720nm通道中获得的等电点与报道的体的等电点几乎相同（2.6-3.2）。然而，扩展纳米通道（580 nm）的等电点降低到小于2.0。这一结果为扩展纳米空间中离子输运的建模提供了重要信息。(C) 2011年美国物理研究所。(doi: 10.1063/1.3644481)
Isoelectric points in extended nanochannels (580-2720 nm) fabricated on fused-silica substrates were measured using the streaming current method. The isoelectric point obtained in a 2720 nm channel was almost the same as the isoelectric point reported for the bulk (2.6-3.2). However, the isoelectric point in the extended nanochannel (580 nm) was decreased to less than 2.0. This result provides important information for the modeling of ion transport in extended nanospace. (C) 2011 American Institute of Physics. [doi:10.1063/1.3644481]