Numerical Analysis of Photoinduced Surface Relief Grating Formation by Particle Method

Numerical Analysis of Photoinduced Surface Relief Grating Formation by Particle Method
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粒子法光致表面浮雕光栅形成的数值分析

DOI:
10.1007/s10043-005-0271-z
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发表时间:
2005
期刊:
影响因子:
1.2
通讯作者:
T. Yatagai
T. Yatagai
中科院分区:
物理与天体物理4区
文献类型:
--
作者:
D. Barada;T. Fukuda;M. Itoh;T. Yatagai

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用流体力学的粒子方法分析了偶氮苯聚合物薄膜上光致表面浮雕光栅形成的时间演化过程。利用不同偏振态的双光束干涉生长了表面浮雕光栅,并与实验结果进行了比较。电磁场作用于偶极子的力和表面力被认为是光诱导质量输运的驱动力。为了计算曲率系数,提出了改进的表面张力模型。数值计算结果与实验结果定性吻合。
The time evolution of photoinduced surface relief grating formation on azobenzene polymer films is analyzed by particle method for fluid mechanics. The surface relief grating is grown by using two beams interference with various polarization states numerically and compared with experimental results. The force acted on the dipole by electromagnetic field and surface force are considered as the driving force for photoinduced mass transport. The improved surface tension model is proposed in order to calculate curvature coefficient. The numerical results are coincided with experimental results qualititatively.
DOI: 10.1016/s0030-4018(01)01078-1
发表时间: 2001-05
影响因子: 2.4
作者:
K. Munakata;K. Harada;M. Itoh;S. Umegaki;T. Yatagai
通讯作者: K. Munakata;K. Harada;M. Itoh;S. Umegaki;T. Yatagai
DOI: --
发表时间: 2004
期刊: Journal of Applied Physics 96・8
影响因子: --
作者:
D.Barada;M.Itoh;T.Yatagai
通讯作者: T.Yatagai
DOI: 10.13182/nse96-a24205
发表时间: 1996-07-01
影响因子: 1.2
作者:
Koshizuka, S;Oka, Y
通讯作者: Oka, Y