Preparation of W–Cu functionally graded material coated with CVD–W for plasma-facing components
Preparation of W–Cu functionally graded material coated with CVD–W for plasma-facing components
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DOI：
10.1016/j.jnucmat.2013.01.326
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发表时间：
2013-11
影响因子：
3.1
通讯作者：
Jiupeng Song;Yang Yu;Zhu Zhigang;Y. Lian;Xiang Liu;Y. Qi
中科院分区：
文献类型：
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作者：
Jiupeng Song;Yang Yu;Zhu Zhigang;Y. Lian;Xiang Liu;Y. Qi
W-Cu功能梯度材料(FGM)被设计为面向等离子体的元件中CuCrZr块材和W表面层之间的过渡层。本研究利用自行研制的超细W-Cu复合粉末制备了W-Cu功能梯度材料，该材料分别由W-10Cu、W-32Cu和W-60Cu三层组成。烧结后的功能梯度材料组织均匀，残余气孔率小于3.3%。采用优化的化学气相沉积(CVD)工艺，在功能梯度材料的W-10Cu侧进行了纯W涂层，沉积速度提高到0.8 mm/h，涂层厚度约为2 mm，密度高达19.23 g/cm3。沉积结束时，CVD-W的柱状晶尺寸在平行于衬底的方向约为20-50μm，在垂直于衬底的方向约为1-1.5 mm。与等离子喷涂W-CuFGM和W涂层相比，本研究开发的FGM和CVD-W涂层具有更好的显微组织，这对部件的热性能和物理性能具有重要意义。
W–Cu functionally graded materials (FGMs) are designed to be a transition layer between CuCrZr bulk material and a W surface layer in plasma-facing components. In this study, a type of in-house developed ultrafine W–Cu composite powder has been used to fabricate a W–Cu FGM, which consists of three layers of W–10Cu, W–32Cu, and W–60Cu respectively. The sintered FGM has a homogeneous microstructure and a residual porosity of less than 3.3%. The W–10Cu side of the FGM has been coated with pure W using an optimized chemical vapor deposition (CVD) process with an increased deposition rate of 0.8 mm/h. The thickness of the coating is around 2 mm and the density is as high as 19.23 g/cm3. The columnar grain size of CVD–W at the end of deposition is approximately 20–50 μm in the direction parallel to the substrate and 1–1.5 mm in the direction perpendicular to the substrate. Compared with plasma-sprayed W–Cu FGM and W coating, the FGM and CVD–W developed in this study have a better microstructure, which is important for the thermal and physical properties of the components.