Investigation of inductively coupled Ar and CH4/Ar plasmas and the effect of ion energy on DLC film properties
Investigation of inductively coupled Ar and CH4/Ar plasmas and the effect of ion energy on DLC film properties
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DOI：
10.1088/0963-0252/15/4/016
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发表时间：
2006-11
影响因子：
3.8
通讯作者：
Jie Zhou;Ina T Martin;R. Ayers;E. Adams;Dongping Liu;E. R. Fisher
中科院分区：
文献类型：
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作者：
Jie Zhou;Ina T Martin;R. Ayers;E. Adams;Dongping Liu;E. R. Fisher
利用气相和表面分析技术研究了气相物种对等离子体沉积类金刚石(DLC)薄膜的影响。建立了一个真空系统，用于进行朗缪尔探针和基于能量分析的质谱分析，以表征低压13.56 MHz电感耦合等离子体分子束的气相。低能峰对Ar+在Ar和CH4/Ar等离子体中测量的离子能量分布(IED)的总面积有很大贡献。相比之下，对于这些系统中的所有其他离子，低能峰对IED的贡献较小，这是因为通过离子-中性碰撞进行能量交换的可能性很低。在不同衬底电位下，在硅片上沉积了氢化类金刚石薄膜，研究了离子轰击对薄膜性能的影响。通过傅里叶变换红外光谱、扫描电子显微镜、原子力显微镜和纳米压痕测量对薄膜进行了表征。当施加负偏压时，薄膜的氢含量、表面粗糙度和沉积速率降低，而硬度增加。这些结果表明，离子能量对等离子体沉积类金刚石膜的成分和形貌有显著的影响。
Gas-phase and surface analysis techniques were utilized to investigate the effects of gas-phase species on plasma deposited diamond-like carbon (DLC) thin films. A vacuum system was built to perform Langmuir probe and energy analysis-based mass spectrometry measurements to characterize the gas-phase of low pressure, 13.56 MHz inductively coupled plasma molecular beams. Low-energy peaks contributed significantly to the total area of the ion energy distributions (IEDs) measured for Ar+ in Ar and CH4/Ar plasmas. In contrast, for all other ions in these systems, the low-energy peaks had a lower contribution to the IEDs as a result of the low probability of energy exchange via ion–neutral collisions. Hydrogenated DLC films were deposited on silicon wafers at different substrate potentials to determine the effect of ion bombardment on film properties. Films were characterized via Fourier transform infrared spectroscopy, scanning electron microscopy, atomic force microscopy and nanoindentation measurements. The hydrogen content, surface roughness and deposition rate decreased, whereas the hardness of the films increased when a negative bias voltage was applied. These results demonstrate that ion energy has a significant effect on the composition and morphology of plasma deposited DLC films.