High‐resolution XPS spectromicroscopy
High‐resolution XPS spectromicroscopy
复制标题
高分辨率 XPS 光谱显微镜
DOI：
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发表时间：
2010
期刊：
影响因子：
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通讯作者：
O. Renault
中科院分区：
文献类型：
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作者：
O. Renault
XPS成像和光谱显微镜领域最近取得了重大进展，这要归功于实验室X射线光电子发射显微镜(XPEEM)，这是一种新的、通用的并行成像方法，它展示了在500纳米范围内的芯级图像的横向分辨率，以及来自十米尺寸感兴趣区域的光谱显微镜(J.Electron Spectrc)。雷拉特。菲奥姆。171(2009)，68)。它使用明亮的微聚焦单色Al Kα光源和光电子发射显微镜作为高透过率、像差补偿的双半球分析器形式的成像光谱仪的入射透镜。在这篇文章中，限于XPS光谱显微镜的实验室方面，我们将在简要回顾该领域的历史之后，首先给出这一新型仪器的一些细节，直到目前现有的成像技术。然后，将介绍实验室核心级XPEEM在实际样品上的一些初步结果。展望了定量分析、横向分辨率的提高和实验室来源(包括直接和相互空间的UPS光谱显微镜)的多技术光谱显微镜方面的未来前景。版权所有©2010 John Wiley&Sons，Ltd.
The field of XPS imaging and spectromicroscopy has recently made significant progress thanks to laboratory X‐ray photoelectron emission microscopy (XPEEM), a novel, versatile parallel imaging method for which lateral resolution of core‐level images in the 500 nm range, and spectromicroscopy from decanometric‐size area of interest have been demonstrated (J. Electron Spectroc. Relat. Phenom. 171 (2009), 68). It uses a bright microfocussed monochromated Al Kα source and a photoelectron emission microscope (PEEM) as entrance lens of a high‐transmission, aberration‐compensated imaging spectrometer in the form of a double hemispherical analyzer. In this paper, restricted to laboratory aspects of XPS spectromicroscopy, we will first give some details of this novel instrumentation after a short historical review of the field until the presently existing imaging techniques. Then, some of the first results of laboratory core‐level XPEEM on practical samples will be presented. Future perspectives towards quantitative analysis, improvements of lateral resolution and multitechnique spectromicroscopic aspects with laboratory sources (including UPS spectromicroscopy in direct and reciprocal space) will be drawn. Copyright © 2010 John Wiley & Sons, Ltd.
影响因子：
2.2
作者：
G. Rempfer;W. Skoczylas;O. Griffith
通讯作者：
G. Rempfer;W. Skoczylas;O. Griffith