Highly Photosensitive Surface Relief Gratings Formation in a Liquid Crystalline Azobenzene Polymer: New Implications for the Migration Process
Highly Photosensitive Surface Relief Gratings Formation in a Liquid Crystalline Azobenzene Polymer: New Implications for the Migration Process
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DOI：
10.1021/ma0706428
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发表时间：
2007-05
期刊：
影响因子：
5.5
通讯作者：
N. Zettsu;Toshinobu Ogasawara;Ryusuke Arakawa;S. Nagano;T. Ubukata;T. Seki
中科院分区：
文献类型：
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作者：
N. Zettsu;Toshinobu Ogasawara;Ryusuke Arakawa;S. Nagano;T. Ubukata;T. Seki
我们最近已经证明了在含偶氮苯的液晶聚合物的薄膜中形成显著光敏的表面浮雕光栅（SRG），其从偶氮苯的顺式富集状态进行[Zettsu等人，Adv. Mater. 2001，13，1693; Macromolecules 2004，37，8692]。这样的聚合物表现出意想不到的增强光的敏感性，完成SRG的形成，所需的能量剂量是103倍，低于其他偶氮苯聚合物系统广泛采用。在这里，我们报告详细的结果，系统的探索，了解迁移机制。初始态的顺式异构体含量和辐照强度对迁移效率和浮雕结构有重要的非线性影响。Zisman图表明，光照射导致临界表面张力的大的变化。这些结果强烈表明光化学诱导的相变及其产生的空间调制……
We have recently demonstrated a markedly photosensitive surface relief gratings (SRG) formation in thin films of liquid crystalline azobenzene-containing polymers, which proceeds from a cis-rich state of the azobenzene [Zettsu et al. Adv. Mater. 2001, 13, 1693; Macromolecules 2004, 37, 8692]. Such polymers exhibited unexpected enhancements in the sensitivity to light for the completion of SRG formation, the required energy dose being ∼103-fold lower than that for other azobenzene polymers systems widely employed. Here we report detailed results on the systematic explorations for understanding the migration mechanism. The cis-isomer content at the initial state and irradiation intensity crucially influenced the migration efficiency and the resulting relief structure in nonlinear manners. The Zisman plot showed that the light irradiation leads to a large change in the critical surface tension. Such results strongly suggest that the photochemically induced phase transition and the resulting spatial modulatio...