Dry-cleaning of graphene
Dry-cleaning of graphene
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DOI：
10.1063/1.4871997
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发表时间：
2014-04-14
影响因子：
4
通讯作者：
Kaiser, Ute
中科院分区：
文献类型：
--
作者：
Algara-Siller, Gerardo;Lehtinen, Ossi;Kaiser, Ute
石墨烯表面的碳氢化合物污染阻碍了对其原始状态的结构和电子性质的研究。此外，在许多应用中，污染会降低石墨烯的性能。污染是在样品制备过程中引入的，也直接从空气中吸附。在这里，我们报告了一种简单的干洗方法的开发，用于在独立石墨烯中生产大面积原子清洁区域。用像差校正的高分辨率电子显微镜和电子能谱证明了石墨烯的清洁性。(C)2014 AIP出版有限责任公司。
Studies of the structural and electronic properties of graphene in its pristine state are hindered by hydrocarbon contamination on the surfaces. Also, in many applications, contamination reduces the performance of graphene. Contamination is introduced during sample preparation and is adsorbed also directly from air. Here, we report on the development of a simple dry-cleaning method for producing large atomically clean areas in free-standing graphene. The cleanness of graphene is proven using aberration-corrected high-resolution transmission electron microscopy and electron spectroscopy. (C) 2014 AIP Publishing LLC.