Synthesis, characterization and properties of the DLC films with low Cr concentration doping by a hybrid linear ion beam system
Synthesis, characterization and properties of the DLC films with low Cr concentration doping by a hybrid linear ion beam system
复制标题
混合线性离子束系统低Cr浓度掺杂DLC薄膜的合成、表征及性能
DOI：
10.1016/j.surfcoat.2010.10.057
复制
发表时间：
2011-01-25
影响因子：
5.4
通讯作者：
Wang, Aiying
中科院分区：
文献类型：
--
作者：
Dai, Wei;Wang, Aiying
采用直流磁控溅射法，以纯度为99.99%的Cr靶和线性离子源为溅射源，在硅片上制备了少量Cr掺杂类金刚石（Cr-DLC）薄膜。通过改变供应气体中Ar/CH 4的气体流量比来控制膜中的Cr浓度。利用XPS、拉曼光谱和高分辨透射电镜对薄膜的成分和微观结构进行了分析。通过Stoney方程计算膜的残余应力，其中通过激光反射法测量膜/基底的曲率。采用纳米压痕仪和球-盘摩擦磨损试验机研究了薄膜的力学性能和摩擦学性能。含少量Cr（
A small amount of Cr-doped diamond-like carbon (Cr-DLC) films were deposited on silicon wafers by a hybrid deposition system composed of a DC magnetron sputtering with a Cr target (99.99% purity) and a linear ion source. Cr concentration in the films was controlled by varying the gas flow ratio of Ar/CH4 in the supply gas. XPS, Raman spectroscopy, and HRTEM were employed to analyze the composition and microstructures of the films. The film residual stress was calculated via the Stoney equation, where the curvature of the film/substrate was measured by the laser reflection method. The mechanical properties and tribological behavior of the films were studied by the nano-indentor and ball-on-disc tribometer, respectively. With a small amount of Cr (