Investigation of surface potentials in reduced graphene oxide flake by Kelvin probe force microscopy
Investigation of surface potentials in reduced graphene oxide flake by Kelvin probe force microscopy
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DOI：
10.7567/jjap.57.06hd02
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发表时间：
2018-06-01
影响因子：
1.5
通讯作者：
Kobayashi, Yoshihiro
中科院分区：
文献类型：
--
作者：
Negishi, Ryota;Takashima, Kai;Kobayashi, Yoshihiro
采用Kelvin探针力显微镜对不同热处理条件下制备的还原氧化石墨烯（rGO）薄片的表面电位进行了分析。其中保留大量氧官能团和结构缺陷的低结晶rGO薄片的SP比不含氧和缺陷的机械剥离的石墨烯低得多。另一方面，在用于有效去除氧官能团和修复除畴界之外的结构缺陷的热处理之后，高度结晶的rGO薄片显示出与机械剥离的石墨烯相当的SP。这些结果表明，rGO的功函数是敏感调制的氧官能团和结构缺陷后，热还原过程中，但没有受到显着影响的结构缺陷愈合后，通过在高温下的热处理剩余的域边界。(C)2018日本应用物理学会
The surface potential (SP) of reduced graphene oxide (rGO) flakes prepared by thermal treatments of GO under several conditions was analyzed by Kelvin probe force microscopy. The low-crystalline rGO flakes in which a significant amount of oxygen functional groups and structural defects remain have a much lower SP than mechanically exfoliated graphene free from oxygen and defects. On the other hand, the highly crystalline rGO flake after a thermal treatment for the efficient removal of oxygen functional groups and healing of structural defects except for domain boundary shows SP equivalent to that of the mechanically exfoliated graphene. These results indicate that the work function of rGO is sensitively modulated by oxygen functional groups and structural defects remaining after the thermal reduction process, but is not affected significantly by the domain boundary remaining after the healing of structural defects through the thermal treatment at high temperature. (C) 2018 The Japan Society of Applied Physics