Modeling of the loading path dependent magnetomechanical behavior of Galfenol alloy
Modeling of the loading path dependent magnetomechanical behavior of Galfenol alloy
复制标题
Galfenol 合金加载路径相关磁机械行为的建模
DOI：
10.1088/1674-1056/26/3/037503
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发表时间：
2017-03
影响因子：
1.7
通讯作者：
Zhu Jie
中科院分区：
文献类型：
--
作者：
Jiang Hui;Zhu Jie
单晶Galfenol合金的磁力学行为强烈依赖于加载路径。基于能量的各向异性磁畴旋转模型，假定磁畴之间的相互作用可以忽略，磁矩指向特定方向的概率与该方向的自由能有关，用来模拟磁致伸缩随磁场和应力的变化曲线，并跟踪磁畴的运动轨迹。加载路径依赖效应的主要原因是不同加载路径下磁畴的旋转/翻转。通过选择不同的加载和卸载状态和路径，研究了加载和卸载路径对90磁畴运动的影响。结果表明，预加载磁场可以使90个磁区向45个磁区的方向翻转，这是因为磁场是驱动磁区旋转的驱动力，而最终加载状态和加载路径对90个磁区的运动都有很大影响。
The magnetomechanical behavior of single-crystal Galfenol alloy was found to be strongly dependent on the loading paths. An energy-based anisotropic domain rotation model, assuming that the interaction between domains can be ignored and the probability of the magnetic moment pointing along a particular direction is related to the free energy along this direction, is used to simulate the magnetostriction versus magnetic field and stress curve and to track the magnetic domain motion trail. The main reason for loading path dependent effect is the rotation/flipping of the magnetic domains under different loading paths. The effect of loading and unloading paths on 90 magnetic domain motion was studied by choosing different loading and unloading state and paths. The results show that prior loading magnetic field can make the 90 magnetic domains flip to the directions of 45 domains because the magnetic field is the driving force to make the domains rotate, and the final loading state and the loading path both have great influence on the motion of 90 magnetic domains.
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影响因子：
4.1
作者：
J. Yoo;G. Pelligrini;S. Datta;A. Flatau
通讯作者：
J. Yoo;G. Pelligrini;S. Datta;A. Flatau
影响因子：
3.2
作者：
A. Clark;J. Yoo;J. Cullen;M. Wun-Fogle;G. Petculescu;A. Flatau
通讯作者：
A. Clark;J. Yoo;J. Cullen;M. Wun-Fogle;G. Petculescu;A. Flatau
影响因子：
3.2
作者：
Kellogg, RA;Flatau, AB;Lograsso, TA
通讯作者：
Lograsso, TA
影响因子：
4.1
作者：
Atulasimha, Jayasimha;Flatau, Alison B.;Cullen, James R.
通讯作者：
Cullen, James R.
影响因子：
3.2
作者：
X. Zhao;Nigel J. Mellors;D. G. Lord
通讯作者：
X. Zhao;Nigel J. Mellors;D. G. Lord