Coalescence of ultrathin films by atomic layer deposition or chemical vapor deposition: Models of the minimum thickness based on nucleation and growth rates
Coalescence of ultrathin films by atomic layer deposition or chemical vapor deposition: Models of the minimum thickness based on nucleation and growth rates
复制标题
通过原子层沉积或化学气相沉积实现超薄膜的聚结：基于成核和生长速率的最小厚度模型
DOI：
10.1116/6.0001562
复制
发表时间：
2022
影响因子：
2.9
通讯作者：
Abelson, John R.
中科院分区：
文献类型：
--
作者：
LaFollette, Diana K.;Canova, Kinsey L.;Zhang, Zhejun V.;Abelson, John R.
