Femtosecond laser fabricating black silicon in alkaline solution
Femtosecond laser fabricating black silicon in alkaline solution
复制标题
飞秒激光在碱性溶液中制造黑硅
DOI：
10.1007/s00339-014-8872-7
复制
发表时间：
2015-03-01
影响因子：
2.7
通讯作者：
Liu, Shibing
中科院分区：
文献类型：
--
作者：
Meng, Jiao;Song, Haiying;Liu, Shibing
An efficient approach for enhancing the surface antireflection is proposed, in which a black silicon is fabricated by a femtosecond laser in alkaline solution. In the experiment, 2 wt% NaOH solution is formulated at room temperature (22 +/- A 1 A degrees C). Then, a polished silicon is scanned via femtosecond laser irradiation in 2 wt% NaOH solution. Jungle-like microstructures on the black silicon surface are characterized using an atomic force microscopy. The reflectance of the black silicon is measured at the wavelengths ranging from 400 to 750 nm. Compared to the polished silicon, the black silicon can significantly suppress the optical reflection throughout the visible region (< 5 %). Meanwhile, we also investigated the factors of the black silicon, including the femtosecond laser pulse energy and the scanning speed. This method is simple and effective to acquire the black silicon, which probably has a large advantage in fast and cost-effective black silicon fabrication.
