A regression technique to analyze the second-order nonlinear optical response of thin films.
A regression technique to analyze the second-order nonlinear optical response of thin films.
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DOI：
10.1063/1.1767151
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发表时间：
2004-06
期刊：
影响因子：
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通讯作者：
M. Siltanen;S. Cattaneo;E. Vuorimaa;H. Lemmetyinen;T. J. Katz;Karen E. S. Phillips;M. Kauranen
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文献类型：
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作者：
M. Siltanen;S. Cattaneo;E. Vuorimaa;H. Lemmetyinen;T. J. Katz;Karen E. S. Phillips;M. Kauranen
本文提出了一种基于回归分析的新方法来确定薄膜的二阶非线性光学磁化率张量。该技术不需要相互校准被测信号的绝对电平或相位。此外，它产生的指标，解决质量的理论模型描述的样本。我们利用该技术确定了具有极低对称性（手性和各向异性）且具有许多独立张量分量的非消旋手性材料样品的磁化率张量。结果表明，使用详细的理论模型来解释样品的线性光学性质的重要性。
We present a new technique, based on regression analysis, to determine the second-order nonlinear optical susceptibility tensor of thin films. The technique does not require the absolute levels or phases of measured signals to be mutually calibrated. In addition it yields indicators that address the quality of theoretical models describing the sample. We use the technique to determine the susceptibility tensor of samples of a nonracemic chiral material which have very low symmetry (both chiral and anisotropic) and have many independent tensor components. The results show the importance of using detailed theoretical models that account for the linear optical properties of the sample.