Bit patterned media based on block copolymer directed assembly with narrow magnetic switching field distribution
Bit patterned media based on block copolymer directed assembly with narrow magnetic switching field distribution
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DOI：
10.1063/1.3293301
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发表时间：
2010-02-01
影响因子：
4
通讯作者：
Ruiz, R.
中科院分区：
文献类型：
--
作者：
Hellwig, O.;Bosworth, J. K.;Ruiz, R.
电子束定向组装技术结合了电子束光刻的长程相位和位置对准以及嵌段共聚物自组装的锐点尺寸和间距均匀性，被认为非常有希望用于制造满足位图案化介质磁记录系统中写入同步所需的严格磁规范的模板。在我们的研究中，我们表明，这种方法也产生一个更窄的磁开关场分布（SFD）比电子束图案化或嵌段共聚物自组装单独。我们证明了图案的均匀性，即，岛直径和放置分布对于实现紧密磁性SFD也很重要。
Electron-beam (E-beam) directed assembly, which combines the long-range phase and placement registration of e-beam lithography with the sharp dot size and spacing uniformity of block copolymer self assembly, is considered highly promising for fabricating templates that meet the tight magnetic specifications required for write synchronization in bit patterned media magnetic recording systems. In our study, we show that this approach also yields a narrower magnetic switching field distribution (SFD) than e-beam patterning or block copolymer self-assembly alone. We demonstrate that the pattern uniformity, i.e., island diameter and placement distributions are also important for achieving tight magnetic SFDs.