Effects of ion energy and arrival rate on the composition of zirconium oxide films prepared by ion‐beam assisted deposition
Effects of ion energy and arrival rate on the composition of zirconium oxide films prepared by ion‐beam assisted deposition
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DOI：
10.1063/1.362855
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发表时间：
1996-07
影响因子：
3.2
通讯作者：
M. Matsuoka;S. Isotani;S. Miyake;Y. Setsuhara;K. Ogata;N. Kuratani
中科院分区：
文献类型：
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作者：
M. Matsuoka;S. Isotani;S. Miyake;Y. Setsuhara;K. Ogata;N. Kuratani
使用离子束辅助沉积方法生长薄氧化锆膜。金属锆通过电子束蒸发并凝聚在Si衬底上，而氧离子同时被引导到衬底上，从而使离子能量和到达速率比ARR（O/Zr）的基本沉积参数易于测量和控制。X射线光电子能谱（XPS）用于研究氧化和膜的组成。XPS分析表明，Zr 3d光谱中存在四种氧化态（Zr 4 +− Zr 1+），O 1 s光谱中存在两个峰; Zr 4+是所有薄膜中的主要离子，O 1 s光谱中的两个峰分别与氧化物和羟基和/或碳酸盐有关。薄膜的成分分析表明，这些氧相关物质可能与锆结合。组成随离子能量（2 - 20 keV）和ARR（O/Zr）（0.54和1.09）的变化可用离子的偏好性来解释。
Thin zirconium oxide films were grown using the ion‐beam assisted deposition method. Zirconium metal was evaporated by an electron beam and condensed on a Si substrate, while oxygen ions were directed simultaneously onto the substrate, allowing the fundamental deposition parameters of ion energy and arrival rate ratio ARR(O/Zr) to be measured and controlled easily. X‐ray photoelectron spectroscopy (XPS) was used to study the oxidation and the composition of the films. XPS analyses indicated the presence of four oxidation states of zirconium (Zr4+−Zr1+) in Zr 3d spectra and two peaks in O 1s spectra; Zr4+ is a predominant ion in all the films and the two peaks in O 1s spectra are related to the oxide and to hydroxyl groups and/or carbonates, respectively. Composition analyses of the films suggested that these oxygen‐associated species may be bound to zirconium. The variation of composition as a function of ion energy (from 2 to 20 keV) and ARR(O/Zr) (at 0.54 and 1.09) could be explained with the preferenti...