Low temperature mechanical dissipation of an ion-beam sputtered silica film
Low temperature mechanical dissipation of an ion-beam sputtered silica film
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DOI：
10.1088/0264-9381/31/3/035019
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发表时间：
2014-02
影响因子：
3.5
通讯作者：
I. Martin;R. Nawrodt;K. Craig;C. Schwarz;R. Bassiri;G. Harry;J. Hough;S. Penn;S. Reid;R. Robie;S. Rowan
中科院分区：
文献类型：
--
作者：
I. Martin;R. Nawrodt;K. Craig;C. Schwarz;R. Bassiri;G. Harry;J. Hough;S. Penn;S. Reid;R. Robie;S. Rowan
氧化镜涂层中机械耗散引起的热噪声是未来引力波探测器、光学原子钟和其他精密测量系统灵敏度的一个重要限制。在这里，我们提出了一个离子束溅射二氧化硅薄膜的机械耗散在10和300 K之间的温度依赖性的测量。在20 K时观察到一个耗散峰，并且发现其低温耗散特性明显不同于用其他方法沉积的大块二氧化硅和二氧化硅薄膜。这些结果对于更好地理解精密测量中最常用的反射涂层的机械耗散和热噪声的潜在机制非常重要。
Thermal noise arising from mechanical dissipation in oxide mirror coatings is an important limit to the sensitivity of future gravitational wave detectors, optical atomic clocks and other precision measurement systems. Here, we present measurements of the temperature dependence of the mechanical dissipation of an ion-beam sputtered silica film between 10 and 300 K. A dissipation peak was observed at 20 K and the low temperature dissipation was found to have significantly different characteristics than observed for bulk silica and silica films deposited by alternative techniques. These results are important for better understanding the underlying mechanisms of mechanical dissipation, and thus thermal noise, in the most commonly-used reflective coatings for precision measurements.