Characterization of Pinhole in Patterned Oxide Buried in Bonded Silicon-on-Insulator Wafers by Near-Infrared Scattering Topography and Transmission Microscopy
Characterization of Pinhole in Patterned Oxide Buried in Bonded Silicon-on-Insulator Wafers by Near-Infrared Scattering Topography and Transmission Microscopy
复制标题
通过近红外散射形貌和透射显微镜表征埋在键合绝缘体上硅晶圆中的图案化氧化物中的针孔
DOI：
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发表时间：
2008
期刊：
影响因子：
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通讯作者：
Mizuho Morita
中科院分区：
文献类型：
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作者：
Xing Wu;Junichi Uchikoshi;Takaaki Hirokane;Ryuta Yamada;Akihiro Takeuchi;Kenta Arima;Mizuho Morita
