TEM Characterization of W-O-N Coatings
TEM Characterization of W-O-N Coatings
复制标题
W-O-N 涂层的 TEM 表征
DOI：
10.1017/s1431927608089289
复制
发表时间：
2008
影响因子：
2.8
通讯作者：
A. Cavaleiro
中科院分区：
文献类型：
--
作者：
N. Parreira;Y. Pei;D. Galvan;T. Polcar;J. Hosson;A. Cavaleiro
最近，一类基于氧氮化物的新型涂层在研究领域和工业应用中引起了广泛的关注，无论是最近大量关于TM -O-N系统（TM -过渡金属）的出版物，如Ti-O-N， Zr-O-N和Ta-O-N，还是用于光电器件的Si -O-N的发展。这些涂层的性能与化学成分和结构排列有关。然而，人们对TM-O-N体系的结构，特别是对晶格中非金属元素的结构排列方式的了解非常有限。据我们所知，基于XRD和/或XPS分析（例如Si-O-N和Ti-O-N）或Mössbauer光谱分析（Fe-O-N）的氮氧化物结构模型的开发研究很少。TEM很少用于表征TM-O-N涂层，这可能是由于电子辐射对结构的破坏，而Cr-O-N则有报道。本工作旨在通过使用TEM和HR TEM技术来了解W-O-N溅射膜的晶体学，以补充XRD表征提供的信息。
Recently, a new class of coatings based on oxynitrides has drawn much attention in the research field as well as in industrial applications, as shown by either the large numbers of recent publications on TM O N systems (TM—transition metal) such as Ti-O-N, Zr-O-N and Ta-O-N, or the development of Si O-N for opto-electronic devices. The properties of these coatings are related to the chemical composition and the structural arrangement. However, the knowledge about the structure of TM-O-N systems is very limited, especially how the structural arrangement of the non-metallic elements is in the lattices. To the best of our knowledge, only a few studies exist on the development of structural models for oxynitrides, based on XRD and/or XPS analysis, as e.g. Si-O-N and Ti-O-N, or on Mössbauer spectrometry for Fe-O-N. TEM was used scarcely for the characterization of TM-O-N coatings possibly due to the damage of the structure by the electron-irradiation as it is reported for Cr-O-N. This work is aimed at the crystallographic understanding of W-O-N sputtered films by using TEM and HR TEM techniques for complementing the information provided by XRD characterization.