Temperature-Programmed Desorption of Dimethylpyridine Adsorbed on Silica–Alumina Prepared by Chemical Vapor Deposition
Temperature-Programmed Desorption of Dimethylpyridine Adsorbed on Silica–Alumina Prepared by Chemical Vapor Deposition
复制标题
化学气相沉积二氧化硅-氧化铝吸附二甲基吡啶的程序升温脱附
DOI:
10.1246/bcsj.64.1005
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发表时间:
1991
影响因子:
4
通讯作者:
F. Nozaki
中科院分区:
文献类型:
--
作者:
S. Sato;Masahiro Tokumitsu;T. Sodesawa;F. Nozaki
A temperature-programmed desorption of adsorbed dimethylpyridine clarified the characteristic changes in acid type, acid strength, and acid amount of silica–alumina prepared by depositing silica on an alumina support. Lewis acid sites of the alumina changed into Bronsted acid sites together with a change in the acid strength with increasing silica deposition.