Novel Optical Method for Widening Process Window of Phase-Modulated Excimer Laser Crystallization
Novel Optical Method for Widening Process Window of Phase-Modulated Excimer Laser Crystallization
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拓宽相位调制准分子激光结晶工艺窗口的新型光学方法
DOI：
10.1143/jjap.47.947
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发表时间：
2008
期刊：
影响因子：
--
通讯作者：
H. Ishiwara
中科院分区：
文献类型：
--
作者：
Y. Taniguchi;T. Endo;K. Azuma;M. Matsumura;H. Ishiwara
为硅薄膜的“调相准激光退火”方法提供了较宽的工艺窗口。在退火系统的光路中新引入的晶体石英板的双折射效应产生的普通和特殊光线产生一对相位调制器的投影图像。通过将它们的间距调整为调制器模式间距的一半，由于离焦而出现在成对图像中的不良变形相互抵消，从而在样品表面上产生稳定的叠加图像（光强剖面）。光学模拟和实验表明，这种“双像法”将聚焦深度从小于2 μ m扩大到约±6 μ m。
A wide process window has been achieved for “the phase-modulated excimer-laser annealing” method of Si thin films. Ordinary and extraordinary light rays resulting from the birefringence effects of a crystal quartz plate, which is newly introduced within the optical path of the annealing system, generate a pair of projected images of a phase modulator. By adjusting their separation to be half the modulator pattern pitch, undesirable deformations, which appear in pair images owing to defocus, cancel each other out, resulting in a stable superposed image (light intensity profile) on the sample surface. It is shown by optical simulation and experiment that this “double-image method” widens the depth of focus from less than 2 µm to as wide as about ±6 µm.