Diffractive imaging of the dumbbell structure in silicon by spherical-aberration-corrected electron diffraction
Diffractive imaging of the dumbbell structure in silicon by spherical-aberration-corrected electron diffraction
复制标题
DOI：
10.1063/1.3003582
复制
发表时间：
2008-11-03
影响因子：
4
通讯作者：
Tanaka, Nobuo
中科院分区：
文献类型：
--
作者：
Morishita, Shigeyuki;Yamasaki, Jun;Tanaka, Nobuo
已知的晶体硅中的哑铃结构具有 0.136 nm 的间隔，已通过使用电子束的衍射成像清晰地重建。结果中的空间分辨率估计约为 0.1 nm。通过利用球差校正透射电子显微镜中的选区衍射技术，人们可以以原子分辨率重建纳米结构，即使它们没有被真空空间包围，例如嵌入薄膜样品中的局部结构。这意味着本方法具有独特的潜力，可以极大地扩展电子束衍射成像的多功能性。
The dumbbell structure in crystalline silicon as known with the separation of 0.136 nm has been reconstructed clearly by diffractive imaging using an electron beam. The spatial resolution in the result is estimated at about 0.1 nm. By utilizing the selected area diffraction technique in a spherical-aberration-corrected transmission electron microscope, one can reconstruct nanostructures with atomic resolution, even if they are not surrounded by empty space such as localized structures embedded in thin film samples. This means that the present method has a unique potential to expand the versatility of diffractive imaging by electron beams drastically.