Niobium trilayer Josephson tunnel junctions with ultrahigh critical current densities
Niobium trilayer Josephson tunnel junctions with ultrahigh critical current densities
复制标题
具有超高临界电流密度的铌三层约瑟夫森隧道结
DOI：
10.1063/1.109697
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发表时间：
1993
影响因子：
4
通讯作者：
E. Macedo
中科院分区：
文献类型：
--
作者：
R. Miller;W. H. Mallison;A. Kleinsasser;K. Delin;E. Macedo
我们描述了临界电流密度高达400 kA/cm 2的Nb-AlOx-Nb约瑟夫森隧道结的制造和特性，大约比以前报道的这种材料系统大一个数量级。结特性的质量，如在子间隙电压下的电流水平所示，在高Jc结中比在低Jc结中低得多。然而，在20-400 kA/cm 2的整个高Jc范围内，我们的结的质量保持不变（即，子隙电流与临界电流成比例）。
We describe the fabrication and properties of Nb‐AlOx‐Nb Josephson tunnel junctions having critical current densities as high as 400 kA/cm2, roughly an order of magnitude larger than any previously reported for this materials system. The quality of the junction characteristics, as indicated by the current level at subgap voltages, is considerably lower in high‐Jc than in low‐Jc junctions. However, over the entire high‐Jc range of 20–400 kA/cm2, the quality of our junctions remains the same (i.e., subgap current scales with critical current).