Generating high-efficiency neutral beams by using negative ions in an inductively coupled plasma source
Generating high-efficiency neutral beams by using negative ions in an inductively coupled plasma source
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DOI：
10.1116/1.1494820
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发表时间：
2002-09-01
影响因子：
2.9
通讯作者：
Ichiki, K
中科院分区：
文献类型：
--
作者：
Samukawa, S;Sakamoto, K;Ichiki, K
为了最大限度地减少蚀刻过程中电荷积累或紫外线和 X 射线光子造成的辐射损伤，我们开发了高性能中性束蚀刻系统。中性束源由电感耦合等离子体 (ICP) 源和平行的顶部和底部碳板组成。底部碳板有许多孔，用于从等离子体中提取中性束。当对顶板和底板施加直流 (dc) 偏压时，产生的正离子或负离子会加速流向底板。然后，它们中的大多数被有效地转化为中性原子，或者通过在离子传输期间与气体分子以及与底板中的孔侧壁的电荷转移碰撞中中和，或者通过与底板末端附近的低能电子重组。我们发现负离子比正离子更有效地转化为中性原子。负离子中和效率几乎为100%，最大中和通量密度相当于4.0 mA/cm(2)。因此，可以从 ICP 源和我们新型中性束源中的孔径有效地产生中性束。 (C) 2002 年美国真空协会。
To minimize radiation damage caused by charge buildup or ultraviolet and x-ray photons during etching, we developed a high-performance neutral-beam etching system. The neutral-beam source consists of an inductively coupled plasma (ICP) source and parallel top and bottom carbon plates. The bottom carbon plate has numerous apertures for extracting neutral beams from the plasma. When a direct current (dc) bias is applied to the top and bottom plates, the generated positive or negative ions are accelerated toward the bottom plate. Most of them are then efficiently converted into neutral atoms, either by neutralization in charge-transfer collisions with gas molecules during ion transport and with the aperture sidewalls in the bottom plate, or by recombination with low-energy electrons near the end of the bottom plate. We found that negative ions are more efficiently converted into neutral atoms than positive ions. The neutralization efficiency of negative ions was almost 100%, and the maximum neutral flux density was equivalent to 4.0 mA/cm(2). A neutral beam can thus be efficiently produced from the ICP source and apertures in our new neutral-beam source. (C) 2002 American Vacuum Society.