Screening of external magnetic perturbation fields due to sheared plasma flow
Screening of external magnetic perturbation fields due to sheared plasma flow
复制标题
屏蔽由剪切等离子体流引起的外部磁扰动场
DOI:
10.1088/0029-5515/56/9/092008
复制
发表时间:
2016-07
期刊:
影响因子:
--
通讯作者:
Y.Liu
中科院分区:
文献类型:
--
作者:
L.Li;Y.Q.Liu;Y.Liang;N.Wang;Q.Luan;F.C.Zhong;Y.Liu
Within the single fluid resistive magnetohydrodynamic model, systematic toroidal modelling efforts are devoted to investigate the plasma response induced screening of the applied external 3D magnetic field perturbations in the presence of sheared toroidal flow. One particular issue of interest is addressed, when the local flow speed approaches zero at the perturbation rational surface inside the plasma. Subtle screening physics, associated with the favourable averaged toroidal curvature effect (the GGJ effect (Glasser et al 1975 Phys. Fluids 7 875)), is found to play an essential role during slow flow near the rational surface by enhancing the screening at reduced flow. A strong cancellation effect between different terms of Ohm’s law is discovered, leading to different screening physics in the GGJ regime, as compared to that of conventional screening of the typical resistive-inertial regime occurring at faster flow. These modelling results may be applicable to interpret certain mode locking experiments, as well as type-I edge localized mode suppression experiments, with resonant magnetic field perturbations being applied to tokamak plasmas at low input toroidal torque.
登录
查看更多内容
影响因子:
2.2
作者:
S. Haskey;M. Lanctot;Y. Liu;J. Hanson;B. Blackwell;R. Nazikian
通讯作者:
S. Haskey;M. Lanctot;Y. Liu;J. Hanson;B. Blackwell;R. Nazikian
影响因子:
3.3
作者:
A. Kirk;W. Suttrop;Yueqiang Liu;I. Chapman;P. Cahyna;T.Eich;C.Fuchs;C.Ham;J. Harrison
通讯作者:
A. Kirk;W. Suttrop;Yueqiang Liu;I. Chapman;P. Cahyna;T.Eich;C.Fuchs;C.Ham;J. Harrison
影响因子:
2.2
作者:
N. Ferraro
通讯作者:
N. Ferraro
影响因子:
2.2
作者:
Yueqiang Liu
通讯作者:
Yueqiang Liu
影响因子:
2.2
作者:
Yueqiang Liu;A. Bondeson;C. Fransson;B. Lennartson;C. Breitholtz
通讯作者:
Yueqiang Liu;A. Bondeson;C. Fransson;B. Lennartson;C. Breitholtz