On Dealing With the Charge Trapped in Floating- Gate MOS (FGMOS) Transistors
On Dealing With the Charge Trapped in Floating- Gate MOS (FGMOS) Transistors
复制标题
浮栅 MOS (FGMOS) 晶体管中电荷捕获的处理
DOI:
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复制
发表时间:
2007
期刊:
影响因子:
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通讯作者:
R. Carvajal
中科院分区:
文献类型:
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作者:
E. Rodríguez;M. Jiménez;R. Carvajal
This brief presents for the first time exhaustive experimental results of the only technique that has proven potential on eliminating residual trapped charge in floating gates without requiring any extra-circuitry or post-fabrication processing of the chip. The brief starts with a brief review of different techniques that have been used in the past to deal with the charge (sometimes to erase it, sometimes to program it) together with a description of the one used in the devices presented here. The validity of the latter is demonstrated with data obtained from 100 different devices, 50 of which make use of the technique. The results open up new application avenues for FGMOS devices, mostly in the context of low-power and low-voltage designs in which the potential of the transistor had already be proven but its feasibility, due to the uncertainty of the trapped charged, was questionable