Low-Temperature Formation of Indium Oxide Thin-Film using Excimer Light by Solution Process and Characterization of Thin-Film Transistor Characteristics
Low-Temperature Formation of Indium Oxide Thin-Film using Excimer Light by Solution Process and Characterization of Thin-Film Transistor Characteristics
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利用准分子光溶液法低温形成氧化铟薄膜并表征薄膜晶体管特性
DOI：
10.1380/vss.65.139
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发表时间：
2022
期刊：
影响因子：
--
通讯作者：
ITO Hiroyasu
中科院分区：
文献类型：
--
作者：
OURA Kazuyori;WADA Hideo;KOYAMA Masatoshi;MAEMOTO Toshihiko;SASA Shigehiko;TAKEZOE Noritaka;SHIMIZU Akihiro;ITO Hiroyasu
