Spirothiopyran-Based Reversibly Saturable Photoresist
Spirothiopyran-Based Reversibly Saturable Photoresist
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DOI：
10.1021/acs.chemmater.7b00506
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发表时间：
2017-05
影响因子：
8.6
通讯作者：
Harikrishnan Vijayamohanan;Edmund F. Palermo;C. Ullal
中科院分区：
文献类型：
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作者：
Harikrishnan Vijayamohanan;Edmund F. Palermo;C. Ullal
超分辨率光刻有望以高通量实现深亚波长分辨率的三维(3D)纳米刻蚀。到目前为止展示的3D超分辨率光刻方案本质上都是连续的，主要是由于缺乏光刻胶化学，该光刻胶化学不仅将可饱和的可逆可切换反应与写入步骤耦合，而且具有低饱和阈值。在这里，我们证明了将螺噻喃的可逆光异构化反应与硫醇-迈克尔共轭加成反应相结合，获得了必要的光化学特性。在非常低的强度阈值下，绿光被发现饱和了对硫醇-迈克尔加成写入步骤的抑制。通过合成一种螺噻喃功能化的聚乙二醇共聚物，我们展示了利用绿光抑制对交联物的空间控制。动力学测量和光动力学模拟相结合的结果表明，在螺环硫杂环化合物上进行干涉光刻是可行的。
Super-resolution lithography holds the promise of achieving three-dimensional (3D) nanopatterning at deep subwavelength resolutions with high throughput. 3D super-resolution lithography schemes demonstrated thus far have all been serial in nature, primarily due to the lack of a photoresist chemistry that not only couples a saturable reversibly switchable reaction with a writing step but also has a low saturation threshold. Here, we demonstrate that combining the reversible photoisomerization of spirothiopyran with the thiol-Michael conjugate addition reaction achieves the necessary photochemical characteristics. Green light was found to saturate inhibition of the thiol-Michael addition writing step at very low intensity thresholds. By formulating a spirothiopyran-functionalized polyethylene glycol copolymer, we demonstrate spatial control over cross-linking using inhibition by green light. Kinetics measurements combined with photokinetic simulations show that interference lithography on a spirothiopyran m...