Characterization of Ti-containing amorphous carbon films prepared on titanium substrates
Characterization of Ti-containing amorphous carbon films prepared on titanium substrates
复制标题
DOI：
10.1023/a:1021807312324
复制
发表时间：
2003-02
影响因子：
4.5
通讯作者：
D. Sheeja;B. Tay;C. Q. Sun;Y. Q. Fu
中科院分区：
文献类型：
--
作者：
D. Sheeja;B. Tay;C. Q. Sun;Y. Q. Fu
在纯钛（Ti）衬底上制备的非晶碳（a：C）薄膜具有较高的本征压应力。为了获得具有不同的电气和机械性能的低应力膜，金属（Ti）离子被纳入等离子体。这是在含金属碳靶的帮助下完成的。采用过滤阴极真空弧（FCVA）技术结合基片脉冲偏压在抛光的纯钛基片上沉积了不同Ti含量的非晶碳膜。利用拉曼光谱仪、X射线衍射仪、原子力显微镜（AFM）、销盘式摩擦磨损试验机和微划痕仪等设备对薄膜进行了表征，并研究了薄膜的微观结构、晶体学、薄膜应力、形貌、摩擦系数和临界载荷等性能随靶材中Ti含量的变化。结果表明，以5at.%含钛碳靶在7kV衬底脉冲偏压下，应力几乎为零。然而，这样的薄膜是较差的，在其摩擦学性能相比，纯a：C膜。
Amorphous carbon (a:C) films prepared on pure titanium (Ti) substrates exhibit relatively high intrinsic compressive stress. In order to obtain low stress films with varied electrical and mechanical properties, metal (Ti) ions are incorporated into the plasma. This is done with the help of metal containing carbon targets. Amorphous carbon films with varied percentage of Ti were deposited on polished pure Ti substrates using Filtered Cathodic Vacuum Arc (FCVA) technique together with substrate pulse biasing. Characterizations of the films were carried out using various equipments including Raman Spectroscopy, X-ray diffractometer, Atomic Force Microscopy (AFM), Pin-on-Disk Tribometer and Micro-Scratch Tester; and properties such as microstructure, crystallography, film stress, morphology, frictional coefficient and critical load were investigated as a function of Ti content in the target. The results suggest that the film prepared with 5 at.% Ti-containing carbon target, under 7 kV substrate pulse bias voltage, displays almost zero stress. However such films are inferior in its Tribological properties compared to that of pure a:C films.