Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
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DOI：
10.3390/coatings10010064
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发表时间：
2020-01-01
期刊：
影响因子：
3.4
通讯作者：
Szeghalmi, Adriana
中科院分区：
文献类型：
--
作者：
Paul, Pallabi;Pfeiffer, Kristin;Szeghalmi, Adriana
减反射涂层（ARC）是各种光学元件必不可少的，包括大量应用的塑料制成的光学元件。然而，塑料上的精密涂层是相当具有挑战性的，因为通常涂层对基材的附着力很低。在这项工作中，优化了在聚甲基丙烯酸甲酯（PMMA）上制备Al2O3、TiO2和SiO2共形光学薄膜的原子层沉积（ALD）工艺，并展示了一个五层ARC。未涂覆的PMMA基板在可见光（VIS）光谱范围内的反射率接近8%，而在420-670 nm的光谱范围内，通过施加双面电弧，反射率降至1.2%以下。总平均反射率为0.7%。优化后的ALD涂层对PMMA基材具有良好的附着力，即使经过气候测试。气候试验后对PMMA上交叉舱口区域的微观分析表明，ALD涂层具有良好的环境稳定性。这些结果使ALD在敏感的热塑性塑料（如PMMA）上沉积均匀、无裂纹、粘接且环保耐用的薄膜层成为可能。
Antireflection coatings (ARC) are essential for various optical components including such made of plastics for high volume applications. However, precision coatings on plastics are rather challenging due to typically low adhesion of the coating to the substrate. In this work, optimization of the atomic layer deposition (ALD) processes towards conformal optical thin films of Al2O3, TiO2 and SiO2 on poly(methyl methacrylate) (PMMA) has been carried out and a five-layer ARC is demonstrated. While the uncoated PMMA substrates have a reflectance of nearly 8% in the visible (VIS) spectral range, this is reduced below 1.2% for the spectral range of 420-670 nm by applying a double-side ARC. The total average reflectance is 0.7%. The optimized ALD coatings show a good adhesion to the PMMA substrates even after the climate test. Microscopic analysis on the cross-hatch areas on PMMA after the climate test indicates very good environmental stability of the ALD coatings. These results enable a possible route by ALD to deposit uniform, crack free, adhesive and environmentally durable thin film layers on sensitive thermoplastics like PMMA.