Effects of Substrate Bias Voltage on Structural, Mechanical and Tribological Properties of Diamond-Like Carbon Films Prepared by Plasma-Enhanced Chemical Vapor Deposition Using Methane and Argon Gases
Effects of Substrate Bias Voltage on Structural, Mechanical and Tribological Properties of Diamond-Like Carbon Films Prepared by Plasma-Enhanced Chemical Vapor Deposition Using Methane and Argon Gases
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基底偏压对甲烷和氩气等离子增强化学气相沉积制备的类金刚石碳薄膜的结构、机械和摩擦学性能的影响
DOI：
10.1143/jjap.47.231
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发表时间：
2008
影响因子：
1.5
通讯作者：
M. Mashita
中科院分区：
文献类型：
--
作者：
H. Nakazawa;Shigeki Katoh;Y. Asai;M. Mashita
我们已经沉积类金刚石碳（DLC）薄膜的等离子体增强化学气相沉积，使用CH 4和Ar气体，并已研究的结构，化学键，附着强度，和摩擦学性能的沉积膜。采用可见拉曼光谱、X射线光电子能谱、傅里叶变换红外光谱、划痕试验和球-板摩擦试验对薄膜的性能进行了表征。从C 1 s-XPS峰估计，在沉积的薄膜中的sp3 C-C和C-H键的分数，随着衬底偏压的增加而减少。拉曼光谱分析表明，薄膜的结构有序化是由衬底偏压的增加引起的。在沉积的薄膜中的sp3-CH 3伸缩的带的强度随衬底偏压而降低。当Ar流量增加时，Ar溅射刻蚀和薄膜的结构有序化得到促进。随着偏置电压的增加，通过进行划痕试验确定的临界载荷和膜的耐磨性增加。
We have deposited diamond-like carbon (DLC) films by plasma-enhanced chemical vapor deposition using CH4 and Ar gases, and have investigated the structure, chemical bonding, adhesion strength, and tribological properties of the deposited films. The film properties have been characterized by visible Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), Fourier transform infrared spectroscopy (FTIR), scratch tests, and ball-on-plate friction tests. The fraction of sp3C–C and C–H bonds in the deposited films, as estimated from C 1s-XPS peaks, decreased with increasing substrate bias voltage. Raman analysis showed that the structural ordering of the films was induced by increasing the substrate bias voltage. The intensity of the band in the sp3-CH3 stretching in the deposited films decreased with the substrate bias voltage. When the Ar-flow rate was increased, the Ar sputter etching and structural ordering of the films were encouraged. As the bias voltage was increased, the critical load determined by conducting scratch tests and the wear resistance of the films increased.