Ultra-high vacuum measurements of the internal stress of PVD titanium films as a function of thickness and its dependence on substrate temperature
Ultra-high vacuum measurements of the internal stress of PVD titanium films as a function of thickness and its dependence on substrate temperature
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超高真空测量 PVD 钛薄膜的内应力与厚度的关系及其对基底温度的依赖性
DOI：
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发表时间：
1992
期刊：
影响因子：
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通讯作者：
R. Abermann
中科院分区：
文献类型：
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作者：
Hj Schneeweiβ;R. Abermann
