Stability of Ta-encapsulating Si clusters on Si(111)-(7×7) surfaces
Stability of Ta-encapsulating Si clusters on Si(111)-(7×7) surfaces
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Si(111)-(7×7)表面Ta封装Si团簇的稳定性
DOI：
10.1088/0022-3727/36/9/101
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发表时间：
2003
期刊：
影响因子：
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通讯作者：
T. Kanayama
中科院分区：
文献类型：
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作者：
N. Uchida;L. Bolotov;T. Miyazaki;T. Kanayama
在离子阱中合成了含钽硅团簇离子TaSi 10 - 13 Hx+，并沉积在Si（111）-（7×7）表面，动能为18 eV。扫描隧道显微镜观察发现，簇吸附在表面上没有分解，与从头计算结果一致，预测簇将具有稳定的Si笼结构与Ta原子在中心。
Tantalum containing Si cluster ions TaSi10–13Hx+ were synthesized in an ion trap and deposited onto Si(111)-(7×7) surfaces with a kinetic energy of 18 eV. Scanning tunnelling microscope observations revealed that the clusters adsorbed on the surface without decomposition, consistent with ab initio calculation results, that predicted the clusters would have stable Si-cage structures with a Ta atom at the centre.