Development and properties of a Freeman-type hybrid ion source
Development and properties of a Freeman-type hybrid ion source
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Freeman型混合离子源的研制及其性能
DOI：
10.1063/1.1150417
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发表时间：
2000
影响因子：
1.6
通讯作者：
M. Kiuchi
中科院分区：
文献类型：
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作者：
Matsumoto Takashi;K. Mimoto;S. Gotô;M. Ohba;Y. Agawa;M. Kiuchi
为了研究能量在10-100 eV范围内的离子沉积的基本原理，我们开发了Freeman型混合离子源和低能质量分析离子束沉积系统。通过分析产生离子的能量分布，估计了离子源的性能。用带有柱面镜分析器和四极质谱计的PPM 421等离子体过程监测仪测量了惰性气体离子（Ne+，Ar+，Kr+，Xe+）和金属离子（Ti+，Fe+，W+，C+）的能量分布。 例如，以25 keV传输的Ar+离子减速到103 eV，能量扩展为±3 eV，并且通过钛靶的溅射产生的Ti+离子具有107±3 eV的能量分布。 该装置所产生的离子的能量被很好地定义，因此可以研究由低能离子形成膜的过程。
In order to investigate the fundamentals of the deposition of ions with energies in the range of 10–100 eV, we developed Freeman-type hybrid ion source and a low-energy mass-analyzed ion beam deposition system. Analyzing the energy distributions of ions generated, we estimated the properties of the ion source. Energy distributions of noble gas ions (Ne+, Ar+, Kr+, Xe+), and metal ions (Ti+, Fe+, W+, C+) were measured by a PPM421 plasma process monitor with a cylindrical mirror analyzer and a quadrupole mass spectrometer. For instance, Ar+ ions transported at 25 keV were decelerated to 103 eV with an energy spread of ±3 eV, and Ti+ ions generated by sputtering of a titanium target had an energy distribution of 107±3 eV. The energy of ions generated by this apparatus was well defined, and so it is possible to investigate film formation processes by low-energy ions.
T.Itoh；Y.Yamamura；N.Itoh：“离子束辅助薄膜生长” ELSEVIER，59-100 (1989)
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