Birefringent Pattern Formation in Photoinactive Liquid Crystalline Polymer Films Based on a Photoalignment Technique with Top-Coating of Cinnamic Acid Derivatives via H-Bonds
Birefringent Pattern Formation in Photoinactive Liquid Crystalline Polymer Films Based on a Photoalignment Technique with Top-Coating of Cinnamic Acid Derivatives via H-Bonds
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基于通过氢键涂覆肉桂酸衍生物的光配向技术在光惰性液晶聚合物薄膜中形成双折射图案
DOI：
10.1021/acs.langmuir.7b00079
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发表时间：
2017
期刊：
影响因子：
3.9
通讯作者：
Kondo Mizuho
中科院分区：
文献类型：
--
作者：
Kawatsuki Nobuhiro;Fujii Ryosuke;Fujioka Yu;Minami Satoshi;Kondo Mizuho
将4-甲氧基肉桂酸（MCA）的顶涂层施加到含有苯甲酸（BA）侧基（P6 BAM）的光非活性液晶聚合物膜上显示出能够使聚合物结构的热刺激、光诱导重新取向。退火的MCA涂覆的P6 BAM膜导致BA和MCA之间的氢键形成，这也有效地平滑膜表面。暴露于线性偏振（LP）UV光引发MCA基团的轴选择性光反应;随后在P6 BAM的LC温度范围内的热处理放大了BA侧基的分子重新取向，同时消除了MCA分子。MCA的选择性喷墨涂布提供了用于制造具有多个受控取向方向的图案化、取向和可调P6 BAM膜的简易途径。
The application of a top-coating of 4-methoxy cinnamic acid (MCA) onto a photoinactive liquid crystalline polymeric film containing benzoic acid (BA) side groups (P6BAM) is shown to enable thermally stimulated, photoinduced reorientation of the polymer structure. Annealing the MCA-coated P6BAM films leads to H-bond formation between BA and MCA, which also effectively smooths the film surface. Exposure to linearly polarized (LP) UV light initiates axis-selective photoreaction of the MCA groups; subsequent thermal treatment in the LC temperature range of P6BAM amplifies molecular reorientation of the BA side groups, while simultaneously eliminating the MCA molecules. Selective inkjet coating of MCA provides a facile route for the fabrication of patterned, oriented, and rewritable P6BAM films with multiple controlled alignment directions.