Double layer formation caused by contact between different temperature plasmas
Double layer formation caused by contact between different temperature plasmas
复制标题
不同温度等离子体接触导致双层形成
DOI：
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发表时间：
1985
期刊：
影响因子：
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通讯作者：
Tetsuya Sato
中科院分区：
文献类型：
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作者：
S. Ishiguro;T. Kamimura;Tetsuya Sato
通过粒子模拟研究了冷、热等离子体之间电势差的形成。发现在冷等离子体和热等离子体之间的接触表面的热等离子体侧上形成双层结构。电位差近似由φDL <$Teh/2 e给出，其中Teh和e分别是热电子温度和电子电荷。双电层伴随着双电层的低电位侧（冷等离子体）的负电位下降，其深度为φdip <$2Tec/e，其中Tec是冷电子温度。然而，有趣的是，正电位差和负电位降是独立产生的。
The formation of an electrical potential difference between hot and cold plasmas is studied by means of a particle simulation. It is found that a double layer structure is formed on the hot‐plasma side of the contact surface between the cold and hot plasmas. The potential difference is given approximately by φDL∼Teh/2e, where Teh and e are the hot‐electron temperature and the electronic charge, respectively. The double layer is accompanied by a negative potential dip on the low potential side (cold plasma) of the double layer, the depth of which is φdip∼2Tec/e, where Tec is the cold‐electron temperature. Interestingly, however, the positive potential difference and the negative potential dip are created independently.